A-Tech System

RF Sputtering System with 2x7"

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Product Details

Quick Information

  • Model Number : Sputter Lab - 150M

Description



Special Features

  • RF sputtering system for R&D and small scale production

  • Excellent thickness uniformity and surface morphology in deposited layers

  • Silicon and reactive silicon oxide deposition


  • Automatically movable substrate holder

  • Applications
    - Optical device
    - Optical wave guide
    - Passivation layer

  • Wafer capacity : 1 x 6"


  • Average throughput : Up to 30,000 wafers per year


  • Dimension : 1,730L x 1,277H x 725W (mm3)

  • Others
    - Power : AC 1,2kW (13.56MHz), AC 600W (13.56MHz), DC 1kW (optional)
    - Gas : Ar / O2
    - Heater : silicon carbide (heating rate : 40°C/min, max. temp. : 850°C, deviation : negligible)
    - Pump : rotary (600I/min) & cryogenic (900I/s)


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    • RF Sputtering System with 2x7" image

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