A-Tech System

Magnetron Sputter System with 4x6"

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Quick Information

  • Model Number : Sputter Pilot -150C

Description



Special Features

  • 4 x 6" sputter system for R&D and small scale production

  • Excellent thickness uniformity (below ±2.8% for the layer or 228.6 nm in thickness)

  • Highly smooth surface (RMS roughness of deposited layer : 25 A)


  • RF/DC magnetron sputter


  • Automatic loading system

  • Automatically movable substrate holder

  • Applications
    - Optical device
    - Passivation layer
    - Constantan materials

  • Wafer capacity : 20 x 4"


  • Average throughput : Up to 30,000 wafers per year


  • Dimension : 1,575L x 1,269H x 930W (mm3)

  • Others
    - Power : AC 1,2kW for sputter source, AC 600W for substrate bias, Voltage(13.56MHz)
    - Gas : Ar / O2 / H2
    - Pump : rotary (980I/min) & turbo (1000I/s)


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    • Magnetron Sputter System with 4x6" image

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